Fused quartz wafer is high temperature resistant, corrosion resistant, it has excellent mechanical properties and high optical transmission efficiency, it is used in the production and manufacturing of semiconductor, optics and other industries. The applications of quartz wafer includes MEMS, CMOS, CCD sensors, microwave circuits, Internet of things arrays and various optical and laser devices. 

Recomended Products:

Synthetic hydroxy Deep-UV quartz (JGS1)  |  Gas refining Optical quartz (JGS2)

Dimension：4 inch quartz wafer  |  6 inch quartz wafer  |  8 inch quartz wafer  |  58*58mm quartz glass  |  85*85mm rectangular  |  275*275mm rectangular

Torlerance：±0.1mm

Surface quality: S/D 20/40

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Classification of Fused Quzrtz in China

Synthetic hydroxy deep-UV quartz (JGS1)

In China, the synthetic hydroxy quartz is called deep-UV quartz (code JGS1, application band 185-2000nm). CVD method is used to carry out the gas-phase reaction in the gaseous silicon tetrachloride rehydroxygenation flame to generate amorphous silicon dioxide and deposit it on the quartz bottom plate. It is characterized by a large amount of hydroxyl -OH 950-1400ppm. The total amount of metal impurities is less than 0.2ppm, and the transmittance of 1860 Å is as high as 80%. It is resistant to the radiation of 10^10rad γ-ray and other ray particle flow without discoloration. JGS1 deep-UV quartz is the best UV glass. 

Gas refining optical quartz (JGS2)

The most widely used optical quartz (Code JGS2, application band 250-2000nm) adopts the gas refining process. The raw material natural quartz crystal is melted by hydrogen oxygen flame and piled up on the surface of  target quartz glass. JGS2 quartz is characterized by high purity, can be used in electronic and semiconductor industries. JGS2 quartz hydroxyl -OH 150-400ppm, it has good UV and visible light transmittance, widely used as optical parts and lenses. 

Vacuum electrofusion IR quartz (JGS3)

The vacuum electrofusion process is to put crystal powder in a graphite crucible, heat it to 1800-2000 ℃ in a vacuum electrofusion furnace, and melt it under 0.1-10pa vacuum to produce quartz glass. It is the main production method of infrared quartz glass for optical use at present. IR quartz (code JG3, application band 260-3500nm) is characterized by low hydroxyl content (< 5ppm), low absorption in infrared band at 2.7um, but this kind of quartz is low transmittant in deep UV (< 300nm) due to high metal impurities brought by raw material melting process.

Properties of Fused Quartz

Electrical properties:  Fused quartz is an excellent insulating material, which can maintain high dielectric strength and resistance at high temperature, and almost no loss. The dielectric strength of transparent quartz glass is 32 at 200 ℃, and the dielectric loss is 0.0003.

Thermal properties:

a. Temperature resistance: the high temperature resistance of quartz glass far exceeds that of any kind of glass. T melting=1713 ℃, t soft=1580 ℃ ±10 ℃, T annealing=1140 ℃±10 ℃. It can be used at 1450 ℃ for a short time, usually at 1000 ℃ or above, and at 900 ℃ for opacity.

b. Thermal expansion coefficient: the expansion coefficient of quartz glass is very small, α~5×10-7 ℃-1, which is 1/14 of that of flat glass. The reason is that the structure of quartz glass is similar to that of cristobalite phase (cubic), there is no zigzag feature of low temperature variant, and the Si-O bond is strong.

c. Specific heat and thermal conductivity: the specific heat and thermal conductivity of quartz glass increase with the increase of temperature.

d. Viscosity: the viscosity of quartz glass decreases with the increase of hydroxyl (-OH) and impurity content. It has a large viscosity and a narrow temperature range.

Table 1. Expansion coefficient of fused quartz.

Table 2. Specific heat of transparent quartz at different temperatures and thermal conductivity λ.

Table 3. Viscosity of fused quartz at different temperatures.

Mechanical properties: Fused quartz consists of single-component silicon oxygen tetrahedron, with strong silicon oxygen bond, close structure and high mechanical strength, 2-3 times of that of ordinary glass; there is no interstitial ion filling in the network, so the density is small. Density of transparent quartz: D=2.20～2.21g/cm3; P tensile strength～60MPa; P flexural strength～110MPa; P compressive strength～640mpa; Vickers hardness 700kp / mm2; Mohs hardness grade 6; Poisson's ratio 0.17.

Optical properties: Fused quartz has high transmittance from UV (absorption limit is lower than 160nm) to IR region; resonance wavelength of Si-O vibration is 4.45um (4450nm), cut-off long wave transmission; if (-OH) exists, there is absorption band at 2.73um (2730nm) and 1.38um (1380nm); absorption band of  (-OH) and Si-O vibration interaction is 2.22 um。

When quartz glass is exposed to Χ ray and γ ray, the absorption peaks are as follows:

2150 μ absorption peak: caused by the essence of quartz glass;

2950 Å absorption peak: caused by metal impurity aluminum (AL), germanium (GE);

5500 Å absorption peak: caused by hypoxia;

The electric melting transparent quartz glass is easy to turn black when exposed to Co60.